SkiaSharp 4.148.0 marks the first stable release in the SkiaSharp v4 line. The project is now co-maintained by Microsoft's .NET team and Uno Platform, reflecting a broader open-source collaboration.
Abstract: Superior electrostatic control of 2D-FETs enables continued logic power-performance-area (PPA) scaling beyond the 2nm node. Here, we show that WS 2-based 2D devices give ~40% inverter ...
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